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System onlineMo/Si Coatings - Reflectance >65% at 13.5 nm
EUV Multilayer Mirrors - 13.5 nm
M-01
7
Key specifications
M-02
4
Applications
M-03
3
Performance features
Key Features
What Sets This Product Apart
01High reflectance at 13.5 nm for EUV lithography
02Scalable from 25 mm to 650 mm
03Low defect density for high-power EUV sources
Specifications
Technical Details
- 01Reflectance: >65% @ 13.5 nm (6 deg AOI)
- 02Bandwidth: >500 pm FWHM
- 03Standard Size: 1 inch x 6.35 mm
- 04Figure Error: lambda/20 standard, lambda/50 custom
- 05Surface Roughness: <0.3 nm RMS
- 06Substrates: Fused silica, silicon, ULE, metal
- 07Custom: Up to 650 mm diameter
Applications
Where It Excels
- 01EUV lithography
- 02EUV metrology and inspection
- 03Synchrotron and FEL beamlines
- 04High-harmonic generation optics
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