
Resolve What Others Cannot See
From single-photon detection and EUV reflection to crystal orientation and nanofocusing, Opticore turns frontier optics into deployable systems.
Photon detection · EUV optics · Crystal orientation · X-ray focusing
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Control Reflection at 13.5 Nanometers
Extreme ultraviolet multilayer optics
Precision multilayer coatings turn an otherwise absorbed wavelength into a usable optical path for lithography, metrology, and advanced research.
Inspect EUV optics ↗From Frontier Physics to Working Systems
Detect Individual Quanta
Shape Extreme Wavelengths
Measure Crystal Orientation
Configure for the Application
“Make the Invisible Measurable”
Four Platforms. One Measurement Mission

Photon Counting
Resolve individual photons and particles for low-noise imaging, energy-aware measurement, and radiation analysis.
Single Photon Counting Pixel Detectors
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EUV Reflection
Control extreme-ultraviolet beams with multilayer mirrors built for lithography, metrology, and beamline optics.
13.5nm EUV Multilayer Mirror
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Crystal Orientation
Turn Laue diffraction patterns into repeatable orientation decisions for crystals, wafers, and engineered materials.
Vertical Laue Crystal Orientation System
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X-Ray Focusing
Focus X-rays to micro- and nanoscale targets with Fresnel zone plates and custom diffractive optics.
Highest Efficiency Fresnel Zone Plates
Explore platform ↗Signals from the Field
Single-Photon Counting: When Every Event Matters
A practical overview of where photon-counting detectors create value: low-dose imaging, energy-aware measurements, and difficult signals that conventional integration cameras can bury in noise.
What Makes a 13.5 nm EUV Mirror Work
EUV optics are less about visible reflectivity and more about nanometer-scale layer control. This note explains why multilayer design, substrate quality, and process stability matter.
Choosing Fresnel Zone Plates for X-ray Focusing
Fresnel zone plates can focus X-rays where refractive optics struggle. The right choice depends on energy, outermost zone width, aspect ratio, material, and required efficiency.
