Precision Optoelectronics / Singapore

Precision Optoelectronics for Advanced Measurement

From single-photon detection to EUV optics, we deliver measurable solutions for research and industry.

  • Photon Detection
  • EUV Optics
  • Crystal Orientation
  • X-ray Focusing
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Single Photon
Detection Sensitivity
13.5nm
EUV Working Wavelength
0.1°
Orientation Accuracy
4 Platforms
Core Technologies
Conceptual visualization of EUV reflection from a multilayer mirror
Application conceptFrame 01
Concept visualizationScale / adaptive
Observation window

EUV Multilayer Optics

Precision reflection at 13.5nm

High-precision Mo/Si coatings for EUV lithography, metrology, and advanced research applications.

View EUV Optics ↗

Four Technology Platforms

Core capabilities for advanced measurement applications across research and industry.
01

Single Photon Detection

CERN-derived hybrid pixel detectors for low-noise imaging and energy-aware measurements.
02

EUV Multilayer Optics

Precision Mo/Si coatings for extreme ultraviolet lithography and metrology.
03

Crystal Orientation

High-resolution Laue diffraction systems for rapid, repeatable orientation analysis.
04

X-ray Focusing

Fresnel zone plates for nanoscale focusing in synchrotron and microscopy applications.

Application illustrations · Generated scenes explain potential workflows. They are not photographs of our facilities or records of completed tests.

Cleanroom technician inspecting a precision optical sample

Cleanroom inspection / optical sample review

Application Scenarios

Real-World Applications

Our technologies enable breakthrough measurements across semiconductor manufacturing, materials analysis, and scientific research.
13.5nm
EUV lithography

Precision optics for next-generation semiconductor manufacturing.

1-100nm
X-ray analysis

High-resolution imaging and spectroscopy applications.

0.1°
Crystal alignment

Rapid orientation for research and production workflows.

Custom
Tailored solutions

Configured to your specific measurement requirements.

Cleanroom inspection of a reflective optical sample

Semiconductor Manufacturing

EUV lithography optics for advanced chip fabrication and metrology.
EUV mirror sample measured on a precision optical bench

Materials Analysis

X-ray and particle detection for non-destructive testing and characterization.
X-ray focusing bench with a diffractive optical element

Scientific Research

Synchrotron beamlines, microscopy, and nanoscale analysis solutions.
Get Started

Ready to Solve Your Measurement Challenge?

Contact our team to discuss your requirements. We provide expert guidance from initial consultation to system integration.
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