Technology Platforms

Choose the Right Optical Path

Four complementary platforms address detection, reflection, orientation, and focusing across EUV, X-ray, and particle-imaging workflows.

Selection guidance
Start from the measurement objective. We will help connect wavelength, sample, geometry, and performance requirements to a practical system.

15 of 15 products

Single Photon Counting Pixel Detectors

Photon detection

Single Photon Counting Pixel Detectors

The cameras are for material analysis, non-destructive testing, color radiography, or radiation safety. It senses every single particle of radiation of almost any kind, including X-rays, gamma, electrons, ions, and even neutrons. Based on CERN technology, our cameras revolutionize a range of industries, from space to medicine.

Pixel Size
55µm × 55µm (Medipix2/3), 75µm × 75µm (Medipix4)
Pixel Matrix
256 × 256 (Medipix2/3), 512 × 448 (Medipix4)
Vertical Laue Crystal Orientation System

Crystal analysis

Vertical Laue Crystal Orientation System

A high-resolution Crystal Orientation System is the ideal tool to capture and analyse Laue diffraction patterns from a wide range of crystalline materials. This Laue orientation tool combines a high-resolution CCD X-ray detector, high-brilliance X-ray beam and dedicated Laue software, delivering indexed Laue diffraction measurements to 0.1° accuracy in seconds.

Accuracy
Down to 0.1°
Detector
CCD back-reflection, 155 × 105 mm active area
Laue Crystal Orientation System — Laue-XT

Crystal analysis

Laue Crystal Orientation System — Laue-XT

A compact, plug-and-play cabinet system for real-time single-crystal orientation. The Laue-XT features a high-resolution CCD back-reflection detector (155 × 105 mm active area), sealed tungsten-target X-ray source, and dedicated Laue software for automated indexing with 0.1° accuracy. Supports samples up to 450 × 250 × 250 mm.

Accuracy
down to 0.1°
Detector
CCD back-reflection, 155 × 105 mm active area, 2570 × 1710 pixels
High-Aspect-Ratio Fresnel Zone Plates

X-ray optics

High-Aspect-Ratio Fresnel Zone Plates

XRNanotech offers the widest selection of Fresnel zone plates with world-record 7 nm outermost zone width via the Ir-line-doubling technique. Materials include Au, Ni, Ir, Pt, Si, Diamond and more. Optimised for 50 eV to 20 keV with blazed, multi-step, and binary profiles. Fabricated by e-beam lithography, photolithography, and X-ray LIGA.

Outermost zone width
down to 7 nm (Ir-line-doubling), >10 nm (soft X-ray), >25 nm (hard X-ray)
Height
>120 nm (soft X-ray), >700 nm (hard X-ray), 50 nm (EUV)
X-ray Gratings & Beam Splitters

X-ray optics

X-ray Gratings & Beam Splitters

Precision diffraction gratings and beam splitters fabricated via e-beam lithography with user-selectable pitch, height, and orientation. Materials include silicon, diamond, gold, iridium, and more. Available as linear, blazed, or custom patterns on silicon wafers or transparent membranes. Designed for beam splitting, magneto-optical traps, EUV optics, and synchrotron monochromators.

Patterns
Linear, blazed, custom shapes
Fabrication
e-beam lithography with greyscale capability
Custom EUV Multilayer Mirrors (13.5 nm)

EUV optics

Custom EUV Multilayer Mirrors (13.5 nm)

OptiXfab fabricates precision multilayer mirrors for the EUV (13.5 nm), soft X-ray (1–13.5 nm), and XUV (13.5–100 nm) spectral regions. Standard mirrors achieve R > 65% at 13.5 nm with λ/20 form error. Custom optics are available up to 650 mm diameter with λ/50 precision, in spherical, cylindrical, toroidal, elliptical, and parabolic figures.

Peak wavelength
13.5 nm (EUV), 1–13.5 nm (soft X-ray), 13.5–100 nm (XUV)
Reflectivity
R > 65% @ 13.5 nm (standard)
Products | Opticore