EUV optics
Custom EUV Multilayer Mirrors (13.5 nm)
OptiXfab — R > 65%, Up to Ø 650 mm, λ/50 Form Error
- Peak wavelength
- 13.5 nm (EUV), 1–13.5 nm (soft X-ray), 13.5–100 nm (XUV)
- Reflectivity
- R > 65% @ 13.5 nm (standard)
- Diameter
- 1" standard, up to 650 mm custom
Overview
Technical record / 0028
OptiXfab specialises in high-performance reflective multilayer coatings for extreme ultraviolet and soft X-ray wavelengths. Their standard 13.5 nm EUV mirrors achieve reflectivity exceeding 65% at near-normal incidence on 1-inch fused silica substrates with λ/20 form error.
Custom mirrors are fabricated on substrates up to 650 mm diameter in a wide range of figures — spherical (concave and convex), cylindrical, toroidal, elliptical, and parabolic. Substrate materials include fused silica, silicon, ULE, and metals. Form error can be specified down to λ/50 for the most demanding beamline and lithography applications.
What Sets This Product Apart
Technical Details
- Peak wavelength
- 13.5 nm (EUV), 1–13.5 nm (soft X-ray), 13.5–100 nm (XUV)
- Reflectivity
- R > 65% @ 13.5 nm (standard)
- Diameter
- 1" standard, up to 650 mm custom
- Form error
- λ/20 standard, λ/50 custom
- Substrates
- Fused silica, silicon, ULE, metals
- Figures
- Flat, spherical (concave/convex), cylindrical, toroidal, elliptical, parabolic
Where It Excels
- 01EUV lithography illumination and projection
- 02High-harmonic generation (HHG) beam steering
- 03Synchrotron and FEL beamline optics
- 04Solar physics and EUV astronomy
- 05Water-window microscopy (2.3–4.4 nm)
Interested in This Product?
Contact our team for detailed specifications, pricing, and customization options.
Request Information