X-ray optics
High-Aspect-Ratio Fresnel Zone Plates
XRNanotech — 7 nm Outermost Zone, Blazed & Line-Doubled
- Outermost zone width
- down to 7 nm (Ir-line-doubling), >10 nm (soft X-ray), >25 nm (hard X-ray)
- Height
- >120 nm (soft X-ray), >700 nm (hard X-ray), 50 nm (EUV)
- Energy range
- 50 eV – 20 keV
Overview
Technical record / 0023
XRNanotech produces the most advanced Fresnel zone plates available, with the widest material choice and patterning options in the industry. Their Ir-line-doubling technique has demonstrated world-record 7 nm outermost zone width, enabling the highest resolution X-ray nanofocusing.
Zone plates are available in blazed, multi-step, and binary profiles, fabricated via electron beam lithography, electroplating, and atomic layer deposition. Materials include gold, nickel, iridium, platinum, chromium, ruthenium, silicon, silicon nitride, silicon dioxide, diamond, and PMMA. They are mounted on transparent membranes with or without central stops.
What Sets This Product Apart
Technical Details
- Outermost zone width
- down to 7 nm (Ir-line-doubling), >10 nm (soft X-ray), >25 nm (hard X-ray)
- Height
- >120 nm (soft X-ray), >700 nm (hard X-ray), 50 nm (EUV)
- Energy range
- 50 eV – 20 keV
- Materials
- Au, Ir, Pt, Ni, Cr, Ru, Si, SiN, SiO₂, Diamond, PMMA
- Profiles
- Blazed, multi-step, binary
- Fabrication
- e-beam lithography, photolithography, X-ray LIGA
- Additional detail
- Mounted on transparent membranes, with or without central stop
Where It Excels
- 01X-ray nanofocusing at synchrotron beamlines
- 02Scanning transmission X-ray microscopy (STXM)
- 03Full-field transmission X-ray microscopy (TXM)
- 04X-ray fluorescence (XRF) nanoscopy
- 05Free-electron laser (FEL) focusing
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