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System onlineXRNanotech — 7 nm Outermost Zone, Blazed & Line-Doubled
High-Aspect-Ratio Fresnel Zone Plates
M-01
7
Key specifications
M-02
5
Applications
M-03
5
Performance features
Overview
Technical record / 0023
XRNanotech produces the most advanced Fresnel zone plates available, with the widest material choice and patterning options in the industry. Their Ir-line-doubling technique has demonstrated world-record 7 nm outermost zone width, enabling the highest resolution X-ray nanofocusing.
Zone plates are available in blazed, multi-step, and binary profiles, fabricated via electron beam lithography, electroplating, and atomic layer deposition. Materials include gold, nickel, iridium, platinum, chromium, ruthenium, silicon, silicon nitride, silicon dioxide, diamond, and PMMA. They are mounted on transparent membranes with or without central stops.
Key Features
What Sets This Product Apart
01World-record 7 nm outermost zone width
02Widest material choice (12+ materials)
03Blazed profiles for maximum diffraction efficiency
04Line-doubling technique for ultimate resolution
05Custom diameter, focal length, and central stop options
Specifications
Technical Details
- 01Outermost zone width: down to 7 nm (Ir-line-doubling), >10 nm (soft X-ray), >25 nm (hard X-ray)
- 02Height: >120 nm (soft X-ray), >700 nm (hard X-ray), 50 nm (EUV)
- 03Energy range: 50 eV – 20 keV
- 04Materials: Au, Ir, Pt, Ni, Cr, Ru, Si, SiN, SiO₂, Diamond, PMMA
- 05Profiles: Blazed, multi-step, binary
- 06Fabrication: e-beam lithography, photolithography, X-ray LIGA
- 07Mounted on transparent membranes, with or without central stop
Applications
Where It Excels
- 01X-ray nanofocusing at synchrotron beamlines
- 02Scanning transmission X-ray microscopy (STXM)
- 03Full-field transmission X-ray microscopy (TXM)
- 04X-ray fluorescence (XRF) nanoscopy
- 05Free-electron laser (FEL) focusing
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