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System onlineXRNanotech — Blazed, Linear & Custom Patterns
X-ray Gratings & Beam Splitters
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Key specifications
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Applications
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Performance features
Overview
Technical record / 0038
XRNanotech fabricates custom diffraction gratings and beam splitters using advanced e-beam lithography with greyscale patterning capabilities. Every grating can be specified with user-defined pitch, groove height, blaze angle, and orientation to match the exact requirements of the optical system.
Gratings are available on silicon wafers or transparent membranes (Si₃N₄) and can be fabricated from a wide range of materials including gold, iridium, platinum, nickel, chromium, silicon, and diamond. Applications span from synchrotron monochromators and EUV spectrometer optics to magneto-optical traps for cold-atom experiments.
Key Features
What Sets This Product Apart
01Fully customisable grating parameters
02E-beam lithography with nanometre precision
03Blazed and greyscale patterning available
04Compatible with EUV and X-ray wavelengths
Specifications
Technical Details
- 01Patterns: Linear, blazed, custom shapes
- 02Fabrication: e-beam lithography with greyscale capability
- 03Materials: Si, Diamond, Au, Ir, Pt, Ni, Cr
- 04Mounting: Silicon wafers or transparent Si₃N₄ membranes
- 05User-selectable: Pitch, height, blaze angle, orientation
Applications
Where It Excels
- 01Synchrotron and FEL monochromators
- 02EUV spectrometer optics
- 03Magneto-optical traps for cold atoms
- 04Beam splitting for interferometry
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