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System onlineOptiXfab — R > 65%, Up to Ø 650 mm, λ/50 Form Error
Custom EUV Multilayer Mirrors (13.5 nm)
M-01
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Key specifications
M-02
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Applications
M-03
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Performance features
Overview
Technical record / 0042
OptiXfab specialises in high-performance reflective multilayer coatings for extreme ultraviolet and soft X-ray wavelengths. Their standard 13.5 nm EUV mirrors achieve reflectivity exceeding 65% at near-normal incidence on 1-inch fused silica substrates with λ/20 form error.
Custom mirrors are fabricated on substrates up to 650 mm diameter in a wide range of figures — spherical (concave and convex), cylindrical, toroidal, elliptical, and parabolic. Substrate materials include fused silica, silicon, ULE, and metals. Form error can be specified down to λ/50 for the most demanding beamline and lithography applications.
Key Features
What Sets This Product Apart
01R > 65% standard reflectivity at 13.5 nm
02Up to 650 mm diameter custom optics
03λ/50 form error available for demanding applications
04Wide range of optical figures and substrates
05Coatings for EUV, soft X-ray, and XUV regions
Specifications
Technical Details
- 01Peak wavelength: 13.5 nm (EUV), 1–13.5 nm (soft X-ray), 13.5–100 nm (XUV)
- 02Reflectivity: R > 65% @ 13.5 nm (standard)
- 03Diameter: 1" standard, up to 650 mm custom
- 04Form error: λ/20 standard, λ/50 custom
- 05Substrates: Fused silica, silicon, ULE, metals
- 06Figures: Flat, spherical (concave/convex), cylindrical, toroidal, elliptical, parabolic
Applications
Where It Excels
- 01EUV lithography illumination and projection
- 02High-harmonic generation (HHG) beam steering
- 03Synchrotron and FEL beamline optics
- 04Solar physics and EUV astronomy
- 05Water-window microscopy (2.3–4.4 nm)
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