Four complementary platforms address detection, reflection, orientation, and focusing across EUV, X-ray, and particle-imaging workflows.
4 of 15 products
X-ray optics
High efficiency due to material choice (Au, Ni, Si, SiO₂, Ir, Cr, Diamond). Optimized phase shift and low absorption. Blazed optics overcome limitations of binary optics, delivering the highest possible diffraction efficiency for X-ray microscopy and synchrotron applications.
Infrared imaging
A high-sensitivity short-wave infrared (SWIR) camera using a selected InGaAs sensor with VGA resolution (640 × 512). TE cooling reduces dark current for long-exposure imaging. Designed for scientific and industrial applications including semiconductor inspection, solar cell evaluation, and spectroscopy.
X-ray optics
XRNanotech offers the widest selection of Fresnel zone plates with world-record 7 nm outermost zone width via the Ir-line-doubling technique. Materials include Au, Ni, Ir, Pt, Si, Diamond and more. Optimised for 50 eV to 20 keV with blazed, multi-step, and binary profiles. Fabricated by e-beam lithography, photolithography, and X-ray LIGA.
X-ray optics
Precision diffraction gratings and beam splitters fabricated via e-beam lithography with user-selectable pitch, height, and orientation. Materials include silicon, diamond, gold, iridium, and more. Available as linear, blazed, or custom patterns on silicon wafers or transparent membranes. Designed for beam splitting, magneto-optical traps, EUV optics, and synchrotron monochromators.
