Four complementary platforms address detection, reflection, orientation, and focusing across EUV, X-ray, and particle-imaging workflows.
6 of 15 products
EUV optics
This precision optical component is designed for EUV applications, specifically optimized for 13.5nm wavelength. Featuring a multilayer coating of alternating high- and low-refractive index materials, it enhances EUV light reflection. Ideal for EUV lithography and advanced scientific instruments, this mirror exemplifies cutting-edge EUV optics.
Crystal analysis
A high-resolution Crystal Orientation System is the ideal tool to capture and analyse Laue diffraction patterns from a wide range of crystalline materials. This Laue orientation tool combines a high-resolution CCD X-ray detector, high-brilliance X-ray beam and dedicated Laue software, delivering indexed Laue diffraction measurements to 0.1° accuracy in seconds.
Crystal analysis
A compact, plug-and-play cabinet system for real-time single-crystal orientation. The Laue-XT features a high-resolution CCD back-reflection detector (155 × 105 mm active area), sealed tungsten-target X-ray source, and dedicated Laue software for automated indexing with 0.1° accuracy. Supports samples up to 450 × 250 × 250 mm.
Infrared imaging
A high-sensitivity short-wave infrared (SWIR) camera using a selected InGaAs sensor with VGA resolution (640 × 512). TE cooling reduces dark current for long-exposure imaging. Designed for scientific and industrial applications including semiconductor inspection, solar cell evaluation, and spectroscopy.
X-ray optics
Precision diffraction gratings and beam splitters fabricated via e-beam lithography with user-selectable pitch, height, and orientation. Materials include silicon, diamond, gold, iridium, and more. Available as linear, blazed, or custom patterns on silicon wafers or transparent membranes. Designed for beam splitting, magneto-optical traps, EUV optics, and synchrotron monochromators.
EUV optics
OptiXfab fabricates precision multilayer mirrors for the EUV (13.5 nm), soft X-ray (1–13.5 nm), and XUV (13.5–100 nm) spectral regions. Standard mirrors achieve R > 65% at 13.5 nm with λ/20 form error. Custom optics are available up to 650 mm diameter with λ/50 precision, in spherical, cylindrical, toroidal, elliptical, and parabolic figures.
