Four complementary platforms address detection, reflection, orientation, and focusing across EUV, X-ray, and particle-imaging workflows.
7 of 15 products
EUV optics
This precision optical component is designed for EUV applications, specifically optimized for 13.5nm wavelength. Featuring a multilayer coating of alternating high- and low-refractive index materials, it enhances EUV light reflection. Ideal for EUV lithography and advanced scientific instruments, this mirror exemplifies cutting-edge EUV optics.
X-ray optics
High efficiency due to material choice (Au, Ni, Si, SiO₂, Ir, Cr, Diamond). Optimized phase shift and low absorption. Blazed optics overcome limitations of binary optics, delivering the highest possible diffraction efficiency for X-ray microscopy and synchrotron applications.
X-ray imaging
Very high-resolution X-ray imaging detector with 64 megapixel resolution, large square active area, and fast dynamic imaging. A custom scintillator is deposited onto the sensor to enable detection from 1 keV up to 100 keV. Four 16 MP sCMOS sensors are fibre-optically coupled to form a seamless large-area imager.
X-ray optics
XRNanotech offers the widest selection of Fresnel zone plates with world-record 7 nm outermost zone width via the Ir-line-doubling technique. Materials include Au, Ni, Ir, Pt, Si, Diamond and more. Optimised for 50 eV to 20 keV with blazed, multi-step, and binary profiles. Fabricated by e-beam lithography, photolithography, and X-ray LIGA.
X-ray optics
Precision diffraction gratings and beam splitters fabricated via e-beam lithography with user-selectable pitch, height, and orientation. Materials include silicon, diamond, gold, iridium, and more. Available as linear, blazed, or custom patterns on silicon wafers or transparent membranes. Designed for beam splitting, magneto-optical traps, EUV optics, and synchrotron monochromators.
Photon detection
The WidePIX CHROMATIC is ADVACAM's largest pixel detector, scaling Timepix technology to up to 14 megapixels for full-field energy-sensitive X-ray imaging. Designed for industrial NDT, medical imaging research, and synchrotron applications, the CHROMATIC series provides colour X-ray imaging via per-pixel energy discrimination.
EUV optics
OptiXfab fabricates precision multilayer mirrors for the EUV (13.5 nm), soft X-ray (1–13.5 nm), and XUV (13.5–100 nm) spectral regions. Standard mirrors achieve R > 65% at 13.5 nm with λ/20 form error. Custom optics are available up to 650 mm diameter with λ/50 precision, in spherical, cylindrical, toroidal, elliptical, and parabolic figures.
