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Technology Platforms

Choose the Right Optical Path

Four complementary platforms address detection, reflection, orientation, and focusing across EUV, X-ray, and particle-imaging workflows.

Selection guidance
Start from the measurement objective. We will help connect wavelength, sample, geometry, and performance requirements to a practical system.
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12 of 15 products

Single Photon Counting Pixel Detectors

Photon detection

Single Photon Counting Pixel Detectors

The cameras are for material analysis, non-destructive testing, color radiography, or radiation safety. It senses every single particle of radiation of almost any kind, including X-rays, gamma, electrons, ions, and even neutrons. Based on CERN technology, our cameras revolutionize a range of industries, from space to medicine.

Pixel Size
55µm × 55µm (Medipix2/3), 75µm × 75µm (Medipix4)
Pixel Matrix
256 × 256 (Medipix2/3), 512 × 448 (Medipix4)
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Vertical Laue Crystal Orientation System

Crystal analysis

Vertical Laue Crystal Orientation System

A high-resolution Crystal Orientation System is the ideal tool to capture and analyse Laue diffraction patterns from a wide range of crystalline materials. This Laue orientation tool combines a high-resolution CCD X-ray detector, high-brilliance X-ray beam and dedicated Laue software, delivering indexed Laue diffraction measurements to 0.1° accuracy in seconds.

Accuracy
Down to 0.1°
Detector
CCD back-reflection, 155 × 105 mm active area
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High-Aspect-Ratio Fresnel Zone Plates

X-ray optics

High-Aspect-Ratio Fresnel Zone Plates

XRNanotech offers the widest selection of Fresnel zone plates with world-record 7 nm outermost zone width via the Ir-line-doubling technique. Materials include Au, Ni, Ir, Pt, Si, Diamond and more. Optimised for 50 eV to 20 keV with blazed, multi-step, and binary profiles. Fabricated by e-beam lithography, photolithography, and X-ray LIGA.

Outermost zone width
down to 7 nm (Ir-line-doubling), >10 nm (soft X-ray), >25 nm (hard X-ray)
Height
>120 nm (soft X-ray), >700 nm (hard X-ray), 50 nm (EUV)
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Custom EUV Multilayer Mirrors (13.5 nm)

EUV optics

Custom EUV Multilayer Mirrors (13.5 nm)

OptiXfab fabricates precision multilayer mirrors for the EUV (13.5 nm), soft X-ray (1–13.5 nm), and XUV (13.5–100 nm) spectral regions. Standard mirrors achieve R > 65% at 13.5 nm with λ/20 form error. Custom optics are available up to 650 mm diameter with λ/50 precision, in spherical, cylindrical, toroidal, elliptical, and parabolic figures.

Peak wavelength
13.5 nm (EUV), 1–13.5 nm (soft X-ray), 13.5–100 nm (XUV)
Reflectivity
R > 65% @ 13.5 nm (standard)
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